A mask aligner is a device used in the photolithography process to accurately position and expose patterns onto a substrate, typically in microelectronic fabrication.
Where To Use Mask Aligner
Microelectronic fabrication facilities
Research and development laboratories
Semiconductor manufacturing plants
Key Features Of Mask Aligner
High precision alignment and exposure capabilities
Advanced control systems for optimal process control
Robust construction for reliable operation in demanding environments
How To Use Mask Aligner
Prepare the substrate and mask according to standard procedures
Align the mask with the substrate using the aligner's control systems
Expose the pattern onto the substrate under controlled conditions
How Mask Aligner Is Manufactured
The manufacturing process involves various stages, including design and prototyping, material selection and sourcing, tooling and machining, assembly and testing.
Technical Specification Of Mask Aligner
Wavelength:
193 nm
Resolution:
50 nm
Substrate Size:
300 mm x 300 mm
Display:
7-inch touchscreen interface
Power Supply:
100-240 V, 50/60 Hz
The specifications outlined above are critical to the performance and reliability of the mask aligner in various applications. The device's ability to achieve high resolution and precision alignment is essential for producing complex microelectronic devices with minimal defects.
Description Of Mask Aligner
The mask aligner is a sophisticated device designed to facilitate the photolithography process in microelectronic fabrication.
Related Products & Synonyms Of Mask Aligner
The mask aligner is related to other devices used in the photolithography process, such as steppers and scanners.
